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      • HARVEST
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      Fabrication of electroluminescent silicon diodes by plasma ion implantation

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      PRDesautels_Thesis_Dec17.pdf (7.356Mb)
      Date
      2009
      Author
      Desautels, Phillip Roland
      Type
      Thesis
      Degree Level
      Masters
      Metadata
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      Abstract
      This thesis describes the fabrication and testing of electroluminescent diodes made from silicon subjected to plasma ion implantation. A silicon-compatible, electrically driven light source is desired to increase the speed and efficiency of short-range data transfer in the communications and computing industries. As it is an indirect band gap material, ordinary silicon is too inefficient a light source to be useful for these applications. Past experiments have demonstrated that modifying the structural properties of the crystal can enhance its luminescence properties, and that light ion implantation is capable of achieving this effect. This research investigates the relationship between the ion implantation processing parameters, the post-implantation annealing temperature, and the observable electroluminescence from the resulting silicon diodes. Prior to the creation of electroluminescent devices, much work was done to improve the efficiency and reliability of the fabrication procedure. A numerical algorithm was devised to analyze Langmuir probe data in order to improve estimates of implanted ion fluence. A new sweeping power supply to drive current to the probe was designed, built, and tested. A custom software package was developed to improve the speed and reliability of plasma ion implantation experiments, and another piece of software was made to facilitate the viewing and analysis of spectra measured from the finished silicon LEDs. Several dozen silicon diodes were produced from wafers implanted with hydrogen, helium, and deuterium, using a variety of implanted ion doses and post-implantation annealing conditions. One additional device was fabricated out of unimplanted, unannealed silicon. Most devices, including the unimplanted device, were electroluminescent at visible wavelengths to some degree. The intensity and spectrum of light emission from each device were measured. The results suggest that the observed luminescence originated from the native oxide layer on the surface of the ion-implanted silicon, but that the intensity of luminescence could be enhanced with a carefully chosen ion implantation and annealing procedure.
      Degree
      Master of Science (M.Sc.)
      Department
      Physics and Engineering Physics
      Program
      Physics and Engineering Physics
      Supervisor
      Bradley, Michael P.
      Committee
      Klymyshyn, David; Xiao, Chijin; Koustov, Sasha; Tse, John; Hussey, Glenn
      Copyright Date
      2009
      URI
      http://hdl.handle.net/10388/etd-12172009-135418
      Subject
      optoelectronics
      condensed matter physics
      semiconductor physics
      plasma ion implantation
      silicon photonics
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