University of SaskatchewanHARVEST
  • Login
  • Submit Your Work
  • About
    • About HARVEST
    • Guidelines
    • Browse
      • All of HARVEST
      • Communities & Collections
      • By Issue Date
      • Authors
      • Titles
      • Subjects
      • This Collection
      • By Issue Date
      • Authors
      • Titles
      • Subjects
    • My Account
      • Login
      JavaScript is disabled for your browser. Some features of this site may not work without it.
      View Item 
      • HARVEST
      • Electronic Theses and Dissertations
      • Graduate Theses and Dissertations
      • View Item
      • HARVEST
      • Electronic Theses and Dissertations
      • Graduate Theses and Dissertations
      • View Item

      RF-compensated Langmuir Probe Diagnostics of Pulsed Plasma Ion Implantation System

      Thumbnail
      View/Open
      KHODAEE-THESIS-2020.pdf (26.91Mb)
      Ayub-datasets.zip (451.6Mb)
      Date
      2020-01-17
      Author
      Khodaee, Ayub 1993-
      Type
      Thesis
      Degree Level
      Masters
      Metadata
      Show full item record
      Abstract
      The core of this project focuses on the development of a method for prediction of ion implantation dose in processing plasmas. The vital variable is fluence, i.e. ion implantation dose, which is currently predicted by Lieberman model during high-voltage Plasma Ion Implantation (PII). Chapter \ref{chap:intro} starts with an introduction of plasma ion implantation. In chapter \ref{chap:model}, a review of Lieberman model's assumptions as well as a discussion on the limitations of model and the observed discrepancies with measurements are provided. Having a better, more accurate model to get the fluence, is necessary for improving the implantation procedure. Inductively Coupled Plasma (ICP) chambers are used widely for plasma ion implantation. One of the ICP chambers in University of Saskatchewan, ICP-600, is provided with a radio-frequency antenna to provide the power to heat the electrons and therefore ionise the gas. The apparatus is discussed in detail in chapter \ref{chap:apparatus}. To have an understanding of the evolution of the plasma during plasma ion implantation (PII), a full characterisation of plasma is required before and during PII. Acquiring plasma parameters accurately has the utmost importance while characterising plasma with a Langmuir probe. Eliminating radio-frequency waves from the acquired current-voltage curves in a RF-driven plasma has the most effect toward improving electron temperature measurements in such plasmas. In chapter \ref{chap:Langmuir}, the importance of RF-compensation in design and implementation of Langmuir probes is discussed in detail. Also, a discussion on different current-voltage analysis theories is provided. The results of this work is presented in chapter \ref{chap:results}. Demonstrating the importance, RF-compensated results in the steady state argon plasma will be presented in the first part of the chapter. Finally, the time-resolved characterisation of plasma during PII for a metal target, namely stainless steel and a semiconductor target, i.e. silicon, will be presented and discussed in the later part of the same chapter. These experimental data are an important step in order to develop a more accurate model for plasma ion implantation through detecting and taking into account the effective instabilities during the process.
      Degree
      Master of Science (M.Sc.)
      Department
      Physics and Engineering Physics
      Program
      Physics
      Supervisor
      Bradley, Michael; Couedel, Lenaic
      Committee
      Smolyakov, Andrei; Green, Robert; Xiao , Chijin; Klymychyn, David
      Copyright Date
      January 2020
      URI
      http://hdl.handle.net/10388/12543
      Subject
      Plasma, Plasma Diagnostics, Cold Plasma, ICP, RF generated plasma, Langmuir Probe, RF-Compensated Langmuir probe
      Collections
      • Graduate Theses and Dissertations

      Related items

      Showing items related by title, author, creator and subject.

      • Damage Studies of Tungsten Samples Using Dense Plasma Focus Devices 

        Sharma, Priya; 0000-0003-4645-6671 (2020-09-15)
        Design and studies of plasma facing material for a fusion reactor is an engineering challenge. The focus of this M.Sc. thesis research project studies the interaction between the helium (He) ion beam produced in a dense ...
      • ARC FLASH DETECTION THROUGH VOLTAGE/CURRENT SIGNATURES 

        Baker, Geoff (2014-06-20)
        Arc Flash events occur due to faults in electrical equipment combined with a significant release of energy across an electrical arc. Due to the large energy release, plasma is generated, pressures increase, and the plasma ...
      • The promise of nitrogen plasma implanted gallium arsenide for band gap engineering 

        Risch, Marcel (2008)
        This investigation examines band gap engineering of the GaAsN alloy by means of plasma ion implantation. The strong redshift of the alloy's band gap is suitable for telecommunication applications and thus stimulated much ...
      University of Saskatchewan

      University Library

      The University of Saskatchewan's main campus is situated on Treaty 6 Territory and the Homeland of the Métis.

      © University of Saskatchewan
      Contact Us | Disclaimer | Privacy